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Chia Restorative Hair Mask

$38.00

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Free shipping on orders over $50

Description

Chía Restorative Hair Mask – Deep Repair and Intense Nourishment for Damaged Hair

The Latinoil Chía Restorative Hair Mask is an intensive treatment designed to repair, nourish, and strengthen dry, damaged, or chemically treated hair. Enriched with a powerful blend of chia oil, antioxidants, amino acids, and restorative agents, this mask works deep within the hair fiber to restore strength, elasticity, and natural shine.

Its rich, creamy texture allows for deep absorption without weighing hair down, leaving it soft, manageable, and frizz-free. Ideal for hair exposed to heat styling tools, chemical processes, or environmental stressors, it helps recover hydration and vitality.

Benefits

Deep repair of damaged hair fibers
Intensive nourishment with chia oil and amino acids
Reduces breakage and split ends
Hair feels stronger, shinier, and smoother
Sulfate- and paraben-free formula, suitable for all hair types, especially damaged or sensitized hair

How to use

Apply a generous amount to clean, damp hair, distributing from mid-lengths to ends. Leave on for 5 to 10 minutes and rinse thoroughly with warm water. For deeper repair, cover with a thermal cap and leave on longer.

Ingredients

Aqua (Water), Cetrimonium Chloride, Cetyl Alcohol, Cetearyl Alcohol, Caprylic/Capric Triglyceride, Fragance (Parfum), Dimethicone, Amodimethicone, Polyquaternium-10, Panthenol, Propylene Glycol, Salvia Hispanica Seed Oil (Chia), Simmondsia Chinensis Seed Oil (Jojoba), Cyclomethicone, Ethylene Distearate, Cyclopentasiloxane, Dimethiconol, AcetylCysteine, Wheat Amino Acids, Soy Amino Acids, Serine, Threonine, Glycerin, Hydroxyethyl Ceteaamidopropylidimonium Chloride, Phenoxyethanol, Behenyl Alcohol, Ethylhexylglycerin, BHT, Glycereth-26, Citric Acid, Ceteareth-20, Potassium Sorbate, Isocetyl Alcohol, Quaternium-70, Propylene Glycol, C12-14Sec-Pareth-7, C12-14Sec-Pareth-5, Disodium Laurimino Dipropionate Tocopheryl Phosphates, DimethylPABA Midopropyl Lauridimonium Tosylate, Benzophenone-3, Lauroyl Lysine, Glycine, Arginine HCL, Polyquaternium 55.

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